BIR FAZALI INVERTORLARDA KUCHLANISHNI NAZORAT QILISH

Hozirgi kunda Invertirdan foydalanish kenng so‘ratda foylanilmoqda. Inverterdan chiqadigan kuchlanishning asosiy kattaligi bo'lishi mumkin inverter ichida nazoratni amalga oshirish orqali doimiy bo'lishi uchun boshqariladi, bu yo'q tashqi boshqaruv sxemasi talab qilinadi. Buning eng samarali usuli – bu Inverter ichida ishlatiladigan impuls kengligi modulyatsiyasi (PWM) boshqaruvi. Bu maqolada bir fazali invertirlarni ko‘rib chiqamiz.


07.02.2024 Volume Issue View more Download
THE IMPORTANCE OF ENERGY USE IN THE DEVELOPMENT OF SOCIETY

Energy consumption will continue to increase the level of production increases while ensuring its growth. Economic development is physical and perfectly automatic based on controlled machines, only consumed energy and can only be accelerated by increasing the level of production.


07.02.2024 Volume Issue View more Download
ELECTRONIC SPECTROSCOPY OF HETEROSYSTEM SI/CU SURFACES WITH NANOSCALE PHASES AND FILMS

In this article, valence electron state density, energy band parameters, energetic, optical and electrophysical properties of metal oxide and silicide films with thickness ≤ 40 Å formed on Si/Cu surface during ion implantation and annealing were studied.


07.02.2024 Volume Issue View more Download
COMPOSITION AND MORPHOLOGY OF THE SURFACE OF Si (111) WITH SURFACE FILM OF SiO2 OF DIFFERENT THICKNESS

The composition, morphology, and electronic structure of SiO2 nanofilms of different thicknesses created by thermal oxidation on the Si(111) surface were studied in this work. It was shown that up to a thickness of 30-40 Å the film has an island character. At d ≥ 60 Å, a homogeneous continuous film of SiO2 is formed, the stoichiometric surface roughness does not exceed 1.5 – 2 nm. Regardless of the thickness of the SiO2 films, no noticeable interdiffusion of atoms is observed at the SiO2-Si boundary. The patterns of changes in the composition, the degree of surface coverage, and the energy of plasma oscillations were determined when the thickness of the SiO2/Si(111) films varied from 20 to 120 Å.


07.02.2024 Volume Issue View more Download
ATMEL ATMEGA48, ATMEL ATMEGA88 VA ATMEL ATMEGA168 MIKROKONTROLLERLARINI TAQQOSLASH

Ushbu maqolada Atmel ATmega48, Atmel ATmega88 va Atmel ATmega168 mikrokontrollerlarini taqqoslash ko`rib chiqildi.


07.02.2024 Volume Issue View more Download
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